Abstract: In order to improve the polishing quality and efficiency of large continuous polisher, the quality of polishing plate initial surface was tested by industrial photogrammetry before polishing. By simulating the pressure distribution of each part of the correction plate and the polishing plate, the interaction mechanism of them is analyzed. Combined with the distribution trend of polishing plate initial surface, it is found that the correction plate can largely fix the polishing plate surface, promote the fast convergence by polishing products. However, if there is a “natural defect” of polishing plate, the correction function of the correction plate can not achieve the expected effect, which leads to the long polishing cycle of the product, and the product surface is not ideal.